X-ray Photoelectron Spectroscopy: Phi VersaProbe II

The Phi VersaProbe II is an X-ray Photoelectron Spectroscopy (XPS) system enabling quantitative elemental and chemical state measurement on surfaces and thin film structures. XPS can be applied to a diverse range of materials applications including: polymers, metals, ceramics, catalysts, thin films, photovoltaics, batteries, wear coatings, nanomaterials, semiconductor devices, magnetic storage media, display technology, and biomedical devices.

XPS is an extremely surface sensitive technique, capable of probing only the top few nanometers of a material on its own. However, compositional changes with depth down to a few hundred nm can be documented by recording composition while using an ion gun to gradually remove surface layers.

System Capabilities:
Monochromated Al Kα X-ray Source (1486 eV)
16 Channel Hemispherical Analyzer
Low 10-8 to 10-9 Torr Operating Vacuum Range
25 or 60 mm Diameter Sample Holders
Maximum Sample Height: 1 to 2 cm
X-ray Spot Size: 10 μm to 200 μm
Maximum Analysis Area: 1400 x 1400 μm
Information Depth: 1 to 10 nm
Elemental Sensitivity: 0.1 to 0.01 atomic %

Accessories:
Argon ion and e- guns for charge neutralization and sputter depth profiling.
X-ray induced secondary electron imaging (SXI) capabilities.
Inert atmosphere transfer vessel compatible with 25 mm sample holders.
Prep chamber equipped with LEED, RGA, Kelvin Probe, and sample annealing.