Grants & Projects per year
Fingerprint
Dive into the research topics where Gregory Denbeaux is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
- 6 Similar Profiles
Collaborations and top research areas from the last five years
Recent external collaboration on country/territory level. Dive into details by clicking on the dots or
-
Large-Area (300mm) Development of New EUV(Extreme Ultraviolet) Dry Resist for Ultra-fine Patterning
Denbeaux, G. (PI)
07/1/24 → 12/31/26
Project: Research
-
-
-
Mechanistic Study of Secondary Electron Emission and Molecular Diffusion from Underlayers
Dunn, K. (PI) & Denbeaux, G. (CoPI)
Semiconductor Research Corporation
01/1/24 → 12/31/25
Project: Research
-
Analyzing the effect of electron range on the net resolution for exposures at wavelengths shorter than EUV
Taylor, O., Palanivel, K. K., Monty, R., Eser, I. & Denbeaux, G., Apr 10 2026, Optical and EUV Nanolithography XXXIX. van Lare, C. & Mochi, I. (eds.). SPIE, 1397923. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13979).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
-
Magnetic Imaging of Ion-Irradiation Patterned Co/Pt Multilayers Using Complementary Electron and Photon Probes
Kusinski, G. J., Krishnan, K. M., Denbeaux, G., Thomas, G., Terris, B. D. & Weller, D., Jan 1 2026, Solid-State Nanomagnetism: Volume 2. Jenny Stanford Publishing, Vol. 2. p. 257-262 6 p.Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review
-
Magnetic Reversal of Ion Beam Patterned Co/Pt Multilayers
Kusinski, G. J., Krishnan, K. M., Denbeaux, G. & Thomas, G., Jan 1 2026, Solid-State Nanomagnetism: Volume 2. Jenny Stanford Publishing, Vol. 2. p. 243-250 8 p.Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review
-
Measurements of net electron and reaction range in PMMA: An organometallic resists, and a chemically amplified resist for EUV lithography
Penny, E., Smith, S., Eser, I., Veeravalli, M., Brainard, R. L., Denbeaux, G., Yun, T. & Kim, S. M., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 1398330. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
-
Shelf-life and crystallinity of negative-tone organotin resists
Niluxsshun, M., Ali, M., Sitterly, J., Smith, S., Weinstein, H., Chae, R., Denbeaux, G. & Brainard, R. L., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 139832V. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review