Grants & Projects per year
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Collaborations and top research areas from the last five years
Grants & Projects
- 19 Finished
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Dry Development of EUV Resists
Brainard, R. (PI) & Denbeaux, G. (CoPI)
09/22/23 → 06/22/24
Project: Research
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Controlling EUV resist stochastics through resist processing
Denbeaux, G. (PI) & Brainard, R. (CoPI)
01/1/21 → 12/31/23
Project: Research
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Chemistry and Mechanisms of ECLIPSE Technology (SUNY Portion)
Brainard, R. (PI) & Denbeaux, G. (CoPI)
09/9/20 → 03/11/22
Project: Research
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Measurements of net electron and reaction range in PMMA: An organometallic resists, and a chemically amplified resist for EUV lithography
Penny, E., Smith, S., Eser, I., Veeravalli, M., Brainard, R. L., Denbeaux, G., Yun, T. & Kim, S. M., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 1398330. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
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Shelf-life and crystallinity of negative-tone organotin resists
Niluxsshun, M., Ali, M., Sitterly, J., Smith, S., Weinstein, H., Chae, R., Denbeaux, G. & Brainard, R. L., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 139832V. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
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A Novel Platform of Positive-Tone Organoantimony Resists for EUV
Greenough, J. B., Upadhyay, N. S., Hasan, S., Ali, M., Burke, R., Sitterly, J., Denbeaux, G. & Brainard, R. L., 2025, Advances in Patterning Materials and Processes XLII. Callahan, R. & De Silva, A. (eds.). SPIE, 134280O. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13428).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
1 Scopus citations -
Bio Roll-Up: Self-Assembly of Hydrogel Photoresists
Hasan, S., Brisbois, C., Carufe, K. E. W., Johnson, A., Garrison, J., Sfakis, L., Brunner, V., Albrecht, M., Panneerselvam, A., Talman, L., Xie, Y., Brainard, R. L., Accepted, R. & April, A., 2025, In: Journal of Photopolymer Science and Technology. 38, 3, p. 187-195 9 p.Research output: Contribution to journal › Article › peer-review
Open Access -
Mechanistic Studies of Positive-Tone Organoantimony Resists
Greenough, J. B., Upadhyay, N. S., Hasan, S., Ali, M., Burke, R., Smith, S. T., Denbeaux, G. & Brainard, R. L., 2025, Advances in Patterning Materials and Processes XLII. Callahan, R. & De Silva, A. (eds.). SPIE, 134282L. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13428).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review