Grants & Projects per year
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Dive into the research topics where Robert Brainard is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Grants & Projects
- 32 Finished
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Dry Development of EUV Resists
Brainard, R. (PI) & Denbeaux, G. (CoPI)
09/22/23 → 06/22/24
Project: Research
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Analysis of Polymer-Containing Photoresists
Denbeaux, G. (PI) & Brainard, R. (CoPI)
03/1/22 → 02/28/23
Project: Research
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Measurements of net electron and reaction range in PMMA: An organometallic resists, and a chemically amplified resist for EUV lithography
Penny, E., Smith, S., Eser, I., Veeravalli, M., Brainard, R. L., Denbeaux, G., Yun, T. & Kim, S. M., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 1398330. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
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Negative-tone organotin resists for EUV & E-beam with alkenyl and alkynyl ligands
Niluxsshun, M., Ali, M., Sitterly, J., Burke, R., Greenough, J., Smith, S., Chae, R. & Brainard, R. L., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 139833E. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
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Self-assembly of hydrogel photoresists: Bio roll-up
Hasan, S., Johnson, A., Brisbois, C., Carufe, K. E. W., Garrison, J., Lydecker, L., Brunner, V., Albrecht, M., Panneerselvam, A., Talman, L., Xie, Y. & Brainard, R. L., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 1398328. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
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Shelf-life and crystallinity of negative-tone organotin resists
Niluxsshun, M., Ali, M., Sitterly, J., Smith, S., Weinstein, H., Chae, R., Denbeaux, G. & Brainard, R. L., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 139832V. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
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Synthesis and lithographic evaluation of bismuth complexes using EUV and E-Beam
Weinstein, H., Ali, M., Smith, S., Niluxsshun, M., Kang, S. & Brainard, R. L., Apr 10 2026, Advances in Patterning Materials and Processes XLIII. Callahan, R. & De Silva, A. (eds.). SPIE, 139830N. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 13983).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review