A kinetic model for redox replacement of UPD layers

N. Dimitrov; R. Vasilic; N. Vasiljevic

doi:10.1149/1.2735817

A kinetic model for redox replacement of UPD layers

N. Dimitrov
, R. Vasilic
, N. Vasiljevic

Chemistry

Binghamton University

Research output: Contribution to journal › Article › peer-review

24 Scopus citations

Abstract

The redox replacement at open-circuit potential (OCP) of the underpotentially deposited (UPD) metal layer in the presence of oxygen and/or more noble metal ions is discussed and an analytical model describing this process is proposed. The model establishes a functional relationship between time and potential during the replacement of the UPD layer featuring either Langmuir- or Frumkin-type adsorption behavior. A model validation is performed by fitting experimental OCP transients for oxidative Pb stripping from Cu(111) and Ag(111) substrates. The excellent agreement between theory and experiment enables quantitative prediction and control of the replacement reaction kinetics in a wide variety of systems.

Original language	English
Pages (from-to)	D79-D83
Journal	Electrochemical and Solid-State Letters
Volume	10
Issue number	7
DOIs	https://doi.org/10.1149/1.2735817
State	Published - 2007

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abstract = "The redox replacement at open-circuit potential (OCP) of the underpotentially deposited (UPD) metal layer in the presence of oxygen and/or more noble metal ions is discussed and an analytical model describing this process is proposed. The model establishes a functional relationship between time and potential during the replacement of the UPD layer featuring either Langmuir- or Frumkin-type adsorption behavior. A model validation is performed by fitting experimental OCP transients for oxidative Pb stripping from Cu(111) and Ag(111) substrates. The excellent agreement between theory and experiment enables quantitative prediction and control of the replacement reaction kinetics in a wide variety of systems.",

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AU - Vasilic, R.

AU - Vasiljevic, N.

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AB - The redox replacement at open-circuit potential (OCP) of the underpotentially deposited (UPD) metal layer in the presence of oxygen and/or more noble metal ions is discussed and an analytical model describing this process is proposed. The model establishes a functional relationship between time and potential during the replacement of the UPD layer featuring either Langmuir- or Frumkin-type adsorption behavior. A model validation is performed by fitting experimental OCP transients for oxidative Pb stripping from Cu(111) and Ag(111) substrates. The excellent agreement between theory and experiment enables quantitative prediction and control of the replacement reaction kinetics in a wide variety of systems.

UR - https://www.scopus.com/pages/publications/34248561492

U2 - 10.1149/1.2735817

DO - 10.1149/1.2735817

M3 - Article

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VL - 10

SP - D79-D83

JO - Electrochemical and Solid-State Letters

JF - Electrochemical and Solid-State Letters

IS - 7

ER -

A kinetic model for redox replacement of UPD layers

Abstract

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