A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

Huikai Xie; Ankur Jain; Tuqiang Xie; Yingtian Pan; Gary K. Fedder

A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

Huikai Xie
, Ankur Jain
, Tuqiang Xie
, Yingtian Pan
, Gary K. Fedder

Biomedical Engineering

Stony Brook University

University of Florida
Stony Brook University
Carnegie Mellon University

Research output: Contribution to journal › Conference article › peer-review

5 Scopus citations

Abstract

This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.

Original language	English
Pages (from-to)	861-863
Number of pages	3
Journal	OSA Trends in Optics and Photonics Series
Volume	88
State	Published - 2003
Event	Conference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, United States Duration: Jun 1 2003 → Jun 6 2003

Cite this

@article{8f46fc6dc6e24a0e827616c98af3a96c,

title = "A single-crystal silicon-based micromirror with large scanning angle for biomedical applications",

abstract = "This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biom{\'e}dical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.",

author = "Huikai Xie and Ankur Jain and Tuqiang Xie and Yingtian Pan and Fedder, \{Gary K.\}",

year = "2003",

language = "English",

volume = "88",

pages = "861--863",

journal = "OSA Trends in Optics and Photonics Series",

issn = "1094-5695",

note = "Conference on Lasers and Electro-Optics (CLEO); Postconference Digest ; Conference date: 01-06-2003 Through 06-06-2003",

}

TY - JOUR

T1 - A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

AU - Xie, Huikai

AU - Jain, Ankur

AU - Xie, Tuqiang

AU - Pan, Yingtian

AU - Fedder, Gary K.

PY - 2003

Y1 - 2003

N2 - This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.

AB - This paper reports a single-crystalline silicon (SCS)-based micromirror with large scanning angle (up to 31°) which can be used for biomédical imaging. The micromirror is fabricated by using a deep reactive-ion-etch (DRIE) post-CMOS micromachining process. Thin bimorph actuation structures and movable bulk silicon structures are simultaneously achieved. The micromirror is 1 mm by 1 mm in size, coated with aluminum, and thermally actuated by an integrated polysilicon heater. The radius of curvature of the mirror surface is about 50 cm. The mirror rotates 31° at 9 mA. The resonant frequency of the device is 380 Hz.

UR - https://www.scopus.com/pages/publications/8744307663

M3 - Conference article

SN - 1094-5695

VL - 88

SP - 861

EP - 863

JO - OSA Trends in Optics and Photonics Series

JF - OSA Trends in Optics and Photonics Series

T2 - Conference on Lasers and Electro-Optics (CLEO); Postconference Digest

Y2 - 1 June 2003 through 6 June 2003

ER -

A single-crystal silicon-based micromirror with large scanning angle for biomedical applications

Abstract

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