@inproceedings{b44489ef741441338b219a1d76a6a565,
title = "Advanced development techniques for metal-based EUV resists",
abstract = "Pure thin-films of unimolecular organometallic photoresists were lithographically evaluated using extreme ultraviolet light (EUV, λ = 13.5 nm) and developed using solutions containing carboxylic acids. Optimization of development solutions used with a cobalt-oxalate EUV resist (NP1, 2) led to a switch in lithographic tone from negative to positive. Additional optimization led to an improvement in top loss (35 to 7\%) with development in cyclohexanone and 2-butanone, respectively. We saw a drastic improvement in photo-speed (Emax = 5 mJ/cm2) and contrast of the negative-tone imaging with development in certain acidic solutions. Additionally, carboxylic acid solutions provide excellent development conditions for resists that we, in the past, have been unable to successfully develop.",
keywords = "cobalt, contrast, extreme ultraviolet, organometallic, oxalate, photoresist, positive-tone, resist",
author = "Jodi Hotalen and Michael Murphy and William Earley and Michaela Vockenhuber and Yasin Ekinci and Freedman, \{Daniel A.\} and Brainard, \{Robert L.\}",
note = "Publisher Copyright: {\textcopyright} 2017 SPIE.; Extreme Ultraviolet (EUV) Lithography VIII 2017 ; Conference date: 27-02-2017 Through 02-03-2017",
year = "2017",
doi = "10.1117/12.2258126",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Goldberg, \{Kenneth A.\} and Panning, \{Eric M.\}",
booktitle = "Extreme Ultraviolet (EUV) Lithography VIII",
}