An optimization approach to identify processing pathways for achieving tailored thin film morphologies

It is well-known that the performance of thin film organic electronic devices critically depends on the active layer microstructure. Since processing conditions heavily influence the microstructure, identifying optimal fabrication conditions is a crucial step towards the development of high-performance devices. Current state-of-the-art approaches remain predominantly trial-and-error, which are time and resource intensive. In this work, we integrate a morphology evolution framework (based on a phase-field model) with a heuristic optimization scheme to systematically identify promising processing conditions. We show how annealing time and substrate patterning can be simultaneously tuned to achieve a variety of tailored microstructures. The appropriate choice of cost functional is critical to achieving meaningful results. The methodology presented here provides a scalable and extensible approach towards the rational design of tailored microstructures with enhanced functionalities.