Abstract
The atomic arrangement of the technologically important As-rich GaAs(001)-(2×4) reconstructed surface is determined using bias-dependent scanning tunneling microscopy (STM) and first-principles electronic structure calculations. The STM images reveal the relative position and depth of the atomic-scale features within the trenches between the top-layer As dimers, which are in agreement with the β2(2×4) structural model. The bias-dependent simulated STM images reveal that a retraction of the topmost dangling bond orbitals is the novel electronic mechanism that enables the STM tip to image the trench structure. 1999
| Original language | English |
|---|---|
| Pages (from-to) | 2989-2992 |
| Number of pages | 4 |
| Journal | Physical Review Letters |
| Volume | 83 |
| Issue number | 15 |
| DOIs | |
| State | Published - Jan 1 1999 |
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