Communication - Galvanic deposition of gold on silicon from Au(I) alkaline fluoride-free solutions

Deposition of gold from alkaline fluoride-free solutions containing Au(I) ions onto silicon surfaces has been demonstrated. This deposition takes place at room temperature and does not require the presence of a reducing agent in the solution. The results clearly show that Au(I) ions can be reduced to Au(0) by silicon and, as a consequence, gold metal can be deposited at the surface of the substrate.