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Comparative Analysis of the Static Performance of Various HEXFET Layout Approaches for 1.2 kV SiC MOSFETs

  • University at Albany

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

This study compares the static electrical characteristics of 1.2 kV MOSFETs with different layout approaches fabricated on a 6-inch 4H-SiC wafer. Three distinct layout designs-conventional (linear), hexagonal (HEXFET), and elongated HEXFET-were implemented and analyzed, achieving impressive static performance with specific on-resistance (Ron,sp) < 3 mω∗cm2 measured on-wafer. Additionally, a novel layout design for SiC power MOSFETs is presented, which removes the P+ body implant from the traditional HEXFET unit cell. The fabricated devices' measured output, transfer, and blocking performance are compared in this paper, with the proposed and elongated HEXFET demonstrating the potential to reduce the HEXFET's cell pitch and improve 1.2 kV SiC MOSFET electrical performance. fabricated diodes.

Original languageEnglish
Title of host publication2024 IEEE 11th Workshop on Wide Bandgap Power Devices and Applications, WiPDA 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350375602
DOIs
StatePublished - 2024
Event11th IEEE Workshop on Wide Bandgap Power Devices and Applications, WiPDA 2024 - Dayton, United States
Duration: Nov 4 2024Nov 6 2024

Publication series

Name2024 IEEE 11th Workshop on Wide Bandgap Power Devices and Applications, WiPDA 2024

Conference

Conference11th IEEE Workshop on Wide Bandgap Power Devices and Applications, WiPDA 2024
Country/TerritoryUnited States
CityDayton
Period11/4/2411/6/24

Keywords

  • 1.2 kV MOSFET
  • 4H-SiC
  • HEXFET
  • SiC MOSFET
  • hexagonal
  • linear
  • static electrical performance

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