Controlled fractal growth of transition metal dichalcogenides

Peijian Wang; Siyuan Luo; Lincoln Boyle; Hao Zeng; Shaoming Huang

doi:10.1039/c9nr06358g

Controlled fractal growth of transition metal dichalcogenides

Peijian Wang
, Siyuan Luo
, Lincoln Boyle
, Hao Zeng
, Shaoming Huang

Physics

University at Buffalo

Guangdong University of Technology
SUNY Buffalo
Shanghai Jiao Tong University

Research output: Contribution to journal › Article › peer-review

26 Scopus citations

Abstract

We report controlled fractal growth of atomically thin transition metal dichalcogenides (TMDCs) by chemical vapor deposition, with morphological evolution from dendritic to triangular. Several important growth parameters controlling the fractal dimensions were identified, including the relaxation rate, adhesion coefficient, diffusion anisotropy and growth time. A model based on nucleation, diffusion limited aggregation and relaxation was proposed to explain the morphological evolution. The results of the computational simulation based on this model are in good agreement with the experimental results. Our study sheds light on the growth mechanism of TMDCs and paves the way for growth of TMDCs with improved controllability.

Original language	English
Pages (from-to)	17065-17072
Number of pages	8
Journal	Nanoscale
Volume	11
Issue number	36
DOIs	https://doi.org/10.1039/c9nr06358g
State	Published - Sep 28 2019

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title = "Controlled fractal growth of transition metal dichalcogenides",

abstract = "We report controlled fractal growth of atomically thin transition metal dichalcogenides (TMDCs) by chemical vapor deposition, with morphological evolution from dendritic to triangular. Several important growth parameters controlling the fractal dimensions were identified, including the relaxation rate, adhesion coefficient, diffusion anisotropy and growth time. A model based on nucleation, diffusion limited aggregation and relaxation was proposed to explain the morphological evolution. The results of the computational simulation based on this model are in good agreement with the experimental results. Our study sheds light on the growth mechanism of TMDCs and paves the way for growth of TMDCs with improved controllability.",

author = "Peijian Wang and Siyuan Luo and Lincoln Boyle and Hao Zeng and Shaoming Huang",

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T1 - Controlled fractal growth of transition metal dichalcogenides

AU - Wang, Peijian

AU - Luo, Siyuan

AU - Boyle, Lincoln

AU - Zeng, Hao

AU - Huang, Shaoming

PY - 2019/9/28

Y1 - 2019/9/28

N2 - We report controlled fractal growth of atomically thin transition metal dichalcogenides (TMDCs) by chemical vapor deposition, with morphological evolution from dendritic to triangular. Several important growth parameters controlling the fractal dimensions were identified, including the relaxation rate, adhesion coefficient, diffusion anisotropy and growth time. A model based on nucleation, diffusion limited aggregation and relaxation was proposed to explain the morphological evolution. The results of the computational simulation based on this model are in good agreement with the experimental results. Our study sheds light on the growth mechanism of TMDCs and paves the way for growth of TMDCs with improved controllability.

AB - We report controlled fractal growth of atomically thin transition metal dichalcogenides (TMDCs) by chemical vapor deposition, with morphological evolution from dendritic to triangular. Several important growth parameters controlling the fractal dimensions were identified, including the relaxation rate, adhesion coefficient, diffusion anisotropy and growth time. A model based on nucleation, diffusion limited aggregation and relaxation was proposed to explain the morphological evolution. The results of the computational simulation based on this model are in good agreement with the experimental results. Our study sheds light on the growth mechanism of TMDCs and paves the way for growth of TMDCs with improved controllability.

UR - https://www.scopus.com/pages/publications/85072508814

U2 - 10.1039/c9nr06358g

DO - 10.1039/c9nr06358g

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VL - 11

SP - 17065

EP - 17072

JO - Nanoscale

JF - Nanoscale

IS - 36

ER -

Controlled fractal growth of transition metal dichalcogenides

Abstract

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