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Cryogenic characterization of 22-nm FDSOI CMOS technology for quantum computing ICs

  • S. Bonen
  • , U. Alakusu
  • , Y. Duan
  • , M. J. Gong
  • , M. S. Dadash
  • , L. Lucci
  • , D. R. Daughton
  • , G. C. Adam
  • , S. Iordanescu
  • , M. Pasteanu
  • , I. Giangu
  • , H. Jia
  • , L. E. Gutierrez
  • , W. T. Chen
  • , N. Messaoudi
  • , D. Harame
  • , A. Muller
  • , R. R. Mansour
  • , P. Asbeck
  • , S. P. Voinigescu

Research output: Contribution to journalArticlepeer-review

104 Scopus citations

Abstract

An approach is proposed to realize large-scale, 'high-temperature' and high-fidelity quantum computing integrated circuits based on single- and multiple-coupled quantum-dot electron- and hole-spin qubits monolithically integrated with the mm-wave spin manipulation and readout circuitry in a commercial CMOS technology. Measurements of minimum-size 6 nm × 20 nm × 80 nm Si-channel n-MOSFETs (electron-spin qubit), SiGe-channel p-MOSFETs (hole-spin qubit), and double quantum-dot complementary qubits reveal strong quantum effects in the subthreshold region at 2 K, characteristic of resonant tunneling in a quantum dot. S-parameter measurements of a transimpedance amplifier (TIA) for spin readout show an improved performance from 300 K to 2 K. Finally, the qubit-with-TIA circuit has 50-Ω output impedance and 78-dB Ω transimpedance gain with a unity-gain bandwidth of 70 GHz and consumes 3.1 mW.

Original languageEnglish
Article number8528374
Pages (from-to)127-130
Number of pages4
JournalIEEE Electron Device Letters
Volume40
Issue number1
DOIs
StatePublished - Jan 2019

Keywords

  • cryogenics
  • millimeter waves
  • quantum computing
  • semiconductor quantum dots
  • silicon germanium
  • silicon-on-insulator

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