Developing particle detection test bench for vacuum components

Yashdeep Khopkar; Henry Herbol; Mihir Upadhyaya; Gregory Denbeaux; Vibhu Jindal; Patrick Kearney

doi:10.1117/12.919689

Developing particle detection test bench for vacuum components

Yashdeep Khopkar
, Henry Herbol
, Mihir Upadhyaya
, Gregory Denbeaux
, Vibhu Jindal
, Patrick Kearney

Nanoscale Science and Engineering

University at Albany

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Extreme ultraviolet (EUV) lithography is the leading contender for adoption as the next generation lithography technique. One of the critical challenges in this technology is producing defect-free masks. Particles generated in the fabrication process often deposit on the mask blank and result in phase and amplitude defects. Hence, it is important to study the transport, behavior and generation of particles in the ion deposition tool used for mask blank deposition. We show results on detecting particles from ultrahigh vacuum (UHV) valves by using optical counters and condensation particle counters. The particles were also trapped using impactor plates and analyzed with Energy-dispersive x-ray spectroscopy (EDX) for elemental composition.

Original language	English
Title of host publication	Extreme Ultraviolet (EUV) Lithography III
DOIs	https://doi.org/10.1117/12.919689
State	Published - 2012
Event	Extreme Ultraviolet (EUV) Lithography III - San Jose, CA, United States Duration: Feb 13 2012 → Feb 16 2012

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	8322

Conference

Conference	Extreme Ultraviolet (EUV) Lithography III
Country/Territory	United States
City	San Jose, CA
Period	02/13/12 → 02/16/12

Access to Document

10.1117/12.919689

Cite this

@inproceedings{46a5a2e40d774fc39241606c57f3ba54,

title = "Developing particle detection test bench for vacuum components",

abstract = "Extreme ultraviolet (EUV) lithography is the leading contender for adoption as the next generation lithography technique. One of the critical challenges in this technology is producing defect-free masks. Particles generated in the fabrication process often deposit on the mask blank and result in phase and amplitude defects. Hence, it is important to study the transport, behavior and generation of particles in the ion deposition tool used for mask blank deposition. We show results on detecting particles from ultrahigh vacuum (UHV) valves by using optical counters and condensation particle counters. The particles were also trapped using impactor plates and analyzed with Energy-dispersive x-ray spectroscopy (EDX) for elemental composition.",

author = "Yashdeep Khopkar and Henry Herbol and Mihir Upadhyaya and Gregory Denbeaux and Vibhu Jindal and Patrick Kearney",

year = "2012",

doi = "10.1117/12.919689",

language = "English",

isbn = "9780819489784",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Extreme Ultraviolet (EUV) Lithography III",

note = "Extreme Ultraviolet (EUV) Lithography III ; Conference date: 13-02-2012 Through 16-02-2012",

}

Khopkar, Y, Herbol, H, Upadhyaya, M, Denbeaux, G, Jindal, V & Kearney, P 2012, Developing particle detection test bench for vacuum components. in Extreme Ultraviolet (EUV) Lithography III., 832225, Proceedings of SPIE - The International Society for Optical Engineering, vol. 8322, Extreme Ultraviolet (EUV) Lithography III, San Jose, CA, United States, 02/13/12. https://doi.org/10.1117/12.919689

Developing particle detection test bench for vacuum components. / Khopkar, Yashdeep; Herbol, Henry; Upadhyaya, Mihir et al.
Extreme Ultraviolet (EUV) Lithography III. 2012. 832225 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 8322).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Developing particle detection test bench for vacuum components

AU - Khopkar, Yashdeep

AU - Herbol, Henry

AU - Upadhyaya, Mihir

AU - Denbeaux, Gregory

AU - Jindal, Vibhu

AU - Kearney, Patrick

PY - 2012

Y1 - 2012

N2 - Extreme ultraviolet (EUV) lithography is the leading contender for adoption as the next generation lithography technique. One of the critical challenges in this technology is producing defect-free masks. Particles generated in the fabrication process often deposit on the mask blank and result in phase and amplitude defects. Hence, it is important to study the transport, behavior and generation of particles in the ion deposition tool used for mask blank deposition. We show results on detecting particles from ultrahigh vacuum (UHV) valves by using optical counters and condensation particle counters. The particles were also trapped using impactor plates and analyzed with Energy-dispersive x-ray spectroscopy (EDX) for elemental composition.

AB - Extreme ultraviolet (EUV) lithography is the leading contender for adoption as the next generation lithography technique. One of the critical challenges in this technology is producing defect-free masks. Particles generated in the fabrication process often deposit on the mask blank and result in phase and amplitude defects. Hence, it is important to study the transport, behavior and generation of particles in the ion deposition tool used for mask blank deposition. We show results on detecting particles from ultrahigh vacuum (UHV) valves by using optical counters and condensation particle counters. The particles were also trapped using impactor plates and analyzed with Energy-dispersive x-ray spectroscopy (EDX) for elemental composition.

UR - https://www.scopus.com/pages/publications/84861513979

U2 - 10.1117/12.919689

DO - 10.1117/12.919689

M3 - Conference contribution

SN - 9780819489784

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Extreme Ultraviolet (EUV) Lithography III

T2 - Extreme Ultraviolet (EUV) Lithography III

Y2 - 13 February 2012 through 16 February 2012

ER -

Developing particle detection test bench for vacuum components

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