Effect of substrate temperature on the properties of TiO₂ composite films deposited by atmospheric pressure chemical vapor deposition

TiO₂/SnO₂:F composite films were deposited by atmospheric pressure chemical vapor deposition with Ti (OC₃H₇)₄ as precursors and SnO₂:F coated glass as substrates. According to the results of scanning electron microscopy, X-ray diffraction, and ultra-violet-visible-near infrared transmission spectroscopy, the formation of rutile TiO₂ can be promoted by the insertion of the rutile SnO₂:F under layer. When the substrate temperature is 480°C, a needle-like structure appears in TiO₂/SnO₂:F composite films, and then disappears as the temperature increases. The optical transmittance in the visible region varies from 60% to 90% with the change of substrate temperature, and is suitable for the daylight demands of buildings. TiO₂/SnO₂:F composite film prepared at the substrate temperature of 530°C has the best photocatalytic properties.