@inproceedings{08592d59c3934affb84100af34ec6e6c,
title = "Enabling inspection solutions for future mask technologies through the development of massively parallel E-Beam inspection",
abstract = "The new device architectures and materials being introduced for sub-10nm manufacturing, combined with the complexity of multiple patterning and the need for improved hotspot detection strategies, have pushed current wafer inspection technologies to their limits. In parallel, gaps in mask inspection capability are growing as new generations of mask technologies are developed to support these sub-10nm wafer manufacturing requirements. In particular, the challenges associated with nanoimprint and extreme ultraviolet (EUV) mask inspection require new strategies that enable fast inspection at high sensitivity. The tradeoffs between sensitivity and throughput for optical and e-beam inspection are well understood. Optical inspection offers the highest throughput and is the current workhorse of the industry for both wafer and mask inspection. E-beam inspection offers the highest sensitivity but has historically lacked the throughput required for widespread adoption in the manufacturing environment. It is unlikely that continued incremental improvements to either technology will meet tomorrow's requirements, and therefore a new inspection technology approach is required; one that combines the high-throughput performance of optical with the high-sensitivity capabilities of e-beam inspection. To support the industry in meeting these challenges SUNY Poly SEMATECH has evaluated disruptive technologies that can meet the requirements for high volume manufacturing (HVM), for both the wafer fab [1] and the mask shop. Highspeed massively parallel e-beam defect inspection has been identified as the leading candidate for addressing the key gaps limiting today's patterned defect inspection techniques. As of late 2014 SUNY Poly SEMATECH completed a review, system analysis, and proof of concept evaluation of multiple e-beam technologies for defect inspection. A champion approach has been identified based on a multibeam technology from Carl Zeiss. This paper includes a discussion on the need for high-speed e-beam inspection and then provides initial imaging results from EUV masks and wafers from 61 and 91 beam demonstration systems. Progress towards high resolution and consistent intentional defect arrays (IDA) is also shown.",
keywords = "defect inspection, e-beam inspection, mask inspection, massively parallel, multibeam, multicolumn",
author = "Matt Malloy and Brad Thiel and Bunday, \{Benjamin D.\} and Stefan Wurm and Vibhu Jindal and Maseeh Mukhtar and Kathy Quoi and Thomas Kemen and Dirk Zeidler and Eberle, \{Anna Lena\} and Tomasz Garbowski and Gregor Dellemann and Peters, \{Jan Hendrik\}",
note = "Publisher Copyright: {\textcopyright} 2015 SPIE.; 31st European Mask and Lithography Conference, EMLC 2015 ; Conference date: 22-06-2015 Through 23-06-2015",
year = "2015",
doi = "10.1117/12.2196120",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Jo Finders and Behringer, \{Uwe F.W.\}",
booktitle = "31st European Mask and Lithography Conference",
}