Abstract
We present a new class of EUV antimony carboxylate photoresists with enhanced reactivity and contrast, through the substitution of heteroatoms into the carboxylate. The lithographic performance of (C6H5)3Sb(O2CCH2X)2 photoresists in which X = methoxy, bromine or iodine is presented. The addition of iodine to the photoresist greatly improves dissolution contrast. Utilizing in-situ mass spectrometry, we show how the identity and degree of volatile photoproducts created during EUV exposure change with the composition of the heteroatom.
| Original language | English |
|---|---|
| Pages (from-to) | 81-86 |
| Number of pages | 6 |
| Journal | Journal of Photopolymer Science and Technology |
| Volume | 34 |
| Issue number | 1 |
| DOIs | |
| State | Published - 2021 |
Keywords
- Antimony
- EUV
- MORE
- Photomechanism
- Photoresist
- α-Bromoacetate
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