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Far-infrared determination of cyclotron and plasma-shifted cyclotron resonances in thin MBE-grown films of α-Sn

  • T. Wojtowicz
  • , M. Dobrowolska
  • , G. Yang
  • , H. Luo
  • , J. K. Furdyna
  • , L. W. Tu
  • , G. K. Wong
  • University of Notre Dame

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

Far-infrared cyclotron resonance and plasma-shifted cyclotron resonance were observed in thin layers of alpha -Sn grown by molecular beam epitaxy on CdTe substrates, and were used to determine the effective mass m* of electrons at the Gamma point and to estimate the dielectric constant epsilon . In these experiments the plasma-shifted cyclotron resonance was observed for the first time at frequencies below the plasma edge, omega < omega p. The data give m*=0.0333+or-0.0002, the matrix element E p=24.0+or-0.5 and an estimate of epsilon approximately=23 for a sample with an electron concentration n approximately=3*1017 cm-3, in good agreement with earlier results obtained on bulk samples.

Original languageEnglish
Article number054
Pages (from-to)S248-S252
JournalSemiconductor Science and Technology
Volume5
Issue number3 S
DOIs
StatePublished - 1990

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