Skip to main navigation Skip to search Skip to main content

Fast coating of TiO2 on glass by chemical vapor deposition at atmospheric pressure

  • Weihao Weng
  • , Chenlu Song
  • , Wenjian Weng
  • , Junbo Liu
  • , Yiming Ying
  • , Gaorong Han
  • Zhejiang University

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

TiO2-based film was fast coated on glass by chemical vapor deposition (CVD) of Ti (OC3H7)4 (TITP) at atmospheric pressure to experimentally simulate the self-cleaning glass production on industrial scale. The microstructures, photo-catalysis and hydrophilicity of the coating were characterized with X-ray diffraction (XRD), scanning electron microscopy (SEM) and ultraviolet-visible (UV-Vis) transmission spectroscopy. The results show that the substrate temperature and moving speed significantly affect the properties of the coating. For example, at a temperature above 580°C and a moving speed of 1.5 m/min, the fairly smooth and dense coating displays the most favorable property.

Original languageEnglish
Pages (from-to)16-20
Number of pages5
JournalZhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology
Volume28
Issue number1
StatePublished - Feb 2008

Keywords

  • APCVD
  • Coated glass
  • Self-cleaning
  • TiO

Fingerprint

Dive into the research topics of 'Fast coating of TiO2 on glass by chemical vapor deposition at atmospheric pressure'. Together they form a unique fingerprint.

Cite this