Abstract
The purpose of this paper is to present a recoating method for the development of a direct digital manufacturing (DDM) process that can be an order of magnitude faster than other currently available DDM processes. In the mask-image-projection-based Stereolithography (MIP-SL) process, projection light controlled by a Digital Micromirror Device (DMD) can quickly cure liquid photopolymer resin in a whole area; a fast recoating method is required for achieving truly high-speed fabrication. We investigate the bottom-up projection system in the MIP-SL process. For the macro-scale MIP-SL process, a two-way linear motion approach has been developed for the quick spreading of liquid resin into uniform thin layers. In comparison, a direct pull-up motion can be used in the micro-scale MIP-SL process. The system design and related settings for achieving a fabrication speed of a few seconds per layer are presented. Additionally, the hardware, software, and material setups for fabricating three-dimensional (3D) digital models are presented. Experimental studies using the developed testbed have been performed to verify the effectiveness and efficiency of the presented fast MIP-SL process.
| Original language | English |
|---|---|
| Pages | 846-862 |
| Number of pages | 17 |
| State | Published - 2012 |
| Event | 23rd Annual International Solid Freeform Fabrication Symposium - An Additive Manufacturing Conference, SFF 2012 - Austin, TX, United States Duration: Aug 6 2012 → Aug 8 2012 |
Conference
| Conference | 23rd Annual International Solid Freeform Fabrication Symposium - An Additive Manufacturing Conference, SFF 2012 |
|---|---|
| Country/Territory | United States |
| City | Austin, TX |
| Period | 08/6/12 → 08/8/12 |
Keywords
- Additive manufacturing
- Fast recoating
- High-speed fabrication
- Stereolithography
Fingerprint
Dive into the research topics of 'Fast recoating methods for the projection-based stereolithography process in micro- and macro-scales'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver