Forum on Artificial Intelligence/Machine Learning for Design and Development of Applied Materials

Osvaldo N. Oliveira; David Beljonne; Stanislaus S. Wong; Kirk S. Schanze

doi:10.1021/acsami.1c18225

Forum on Artificial Intelligence/Machine Learning for Design and Development of Applied Materials

Osvaldo N. Oliveira
, David Beljonne
, Stanislaus S. Wong
, Kirk S. Schanze

Chemistry

Stony Brook University

Research output: Contribution to journal › Editorial

7 Scopus citations

Original language	English
Pages (from-to)	53301-53302
Number of pages	2
Journal	ACS Applied Materials and Interfaces
Volume	13
Issue number	45
DOIs	https://doi.org/10.1021/acsami.1c18225
State	Published - Nov 17 2021

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10.1021/acsami.1c18225

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title = "Forum on Artificial Intelligence/Machine Learning for Design and Development of Applied Materials",

author = "Oliveira, \{Osvaldo N.\} and David Beljonne and Wong, \{Stanislaus S.\} and Schanze, \{Kirk S.\}",

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doi = "10.1021/acsami.1c18225",

language = "English",

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journal = "ACS Applied Materials and Interfaces",

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T1 - Forum on Artificial Intelligence/Machine Learning for Design and Development of Applied Materials

AU - Oliveira, Osvaldo N.

AU - Beljonne, David

AU - Wong, Stanislaus S.

AU - Schanze, Kirk S.

PY - 2021/11/17

Y1 - 2021/11/17

UR - https://www.scopus.com/pages/publications/85120088493

U2 - 10.1021/acsami.1c18225

DO - 10.1021/acsami.1c18225

M3 - Editorial

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SN - 1944-8244

VL - 13

SP - 53301

EP - 53302

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

IS - 45

ER -

Forum on Artificial Intelligence/Machine Learning for Design and Development of Applied Materials

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