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High doping effects on in-situ Ohmic contacts to n-InAs

  • Ashish Baraskar
  • , Vibhor Jain
  • , Mark A. Wistey
  • , Uttam Singisetti
  • , Yong Ju Lee
  • , Brian Thibeault
  • , Arthur Gossard
  • , Mark J.W. Rodwell

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

17 Scopus citations

Abstract

We present the effect of active carrier concentration on the specific contact resistivity (ρc) of in-situ molybdenum (Mo) Ohmic contacts to n-type InAs. It is observed that, although the Fermi level pins in the conduction band for InAs, the contact resistivity decreases with the increase in InAs active carrier concentration. The lowest ρc obtained through transmission line model measurements was (0.6±0.4) ×10-8 Ω-cm2 for samples with 8.2×1019 cm-3 active carrier concentration. The contacts were found to remain stable on annealing at 250 °C for 1 hour.

Original languageEnglish
Title of host publication2010 International Conference on Indium Phosphide and Related Materials, 22nd IPRM - Conference Proceedings
Pages481-484
Number of pages4
DOIs
StatePublished - 2010
Event22nd International Conference on Indium Phosphide and Related Materials, IPRM 2010 - Kagawa, Japan
Duration: May 31 2010Jun 4 2010

Publication series

NameConference Proceedings - International Conference on Indium Phosphide and Related Materials

Conference

Conference22nd International Conference on Indium Phosphide and Related Materials, IPRM 2010
Country/TerritoryJapan
CityKagawa
Period05/31/1006/4/10

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