Abstract
The low-temperature internal friction of a-SiO2 films as thin as 2.2 nm has been found to be identical to that of bulk SiO2. It is concluded that the tunneling states are negligibly affected by interactions extending beyond this distance.
| Original language | English |
|---|---|
| Pages (from-to) | 267-269 |
| Number of pages | 3 |
| Journal | Physica B: Physics of Condensed Matter |
| Volume | 219-220 |
| Issue number | 1-4 |
| DOIs | |
| State | Published - Apr 1 1996 |
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