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Impact of Switching Variability, Memory Window, and Temperature on Vector Matrix Operations Using 65nm CMOS Integrated Hafnium Dioxide-based ReRAM Devices

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

Neuromorphic applications utilizing Non-Volatile Memory (NVM) devices have significant potential in imitating the functionality of biological synapses at lower power and area consumption than conventional CMOS. One such NVM candidate is Resistive Random Access Memory (ReRAM) devices utilizing transition metal oxides, such as hafnium oxide (HfO2) as the switching layer. These devices, while able to operate at multiple distinct levels, can suffer from key reliability issues. In this work we explored the use of our unique ReRAM-CMOS hybrid system to recognize images from the Caltech-101 dataset through image similarity processing. The approach utilized vector matrix multiplication (VMM) to correlate image similarity (or difference) between images. The effects of ReRAM switching variability, memory window (MW) and temperature were assessed for performance of VMM-based image recognition.

Original languageEnglish
Title of host publication2022 IEEE Microelectronics Design and Test Symposium, MDTS 2022
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665468169
DOIs
StatePublished - 2022
Event31st IEEE Microelectronics Design and Test Symposium, MDTS 2022 - Albany, United States
Duration: May 23 2022May 26 2022

Publication series

Name2022 IEEE Microelectronics Design and Test Symposium, MDTS 2022

Conference

Conference31st IEEE Microelectronics Design and Test Symposium, MDTS 2022
Country/TerritoryUnited States
CityAlbany
Period05/23/2205/26/22

Keywords

  • ReRAM
  • Reliability
  • Switching Variability
  • Vector Matrix Multiplication

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