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Interface for cryogenic-processed metal/Inp

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Abstract

Au and Pd Schottky contacts to n-InP produce extremely high barrier heights and low leakage currents when deposition is on a substrate cooled to 77K. Extensive chemical and structural analyses indicate that this process causes the metal film to be continuous at 50Angstrom, much better than in standard processing. Stoichiometry of InP near he surface is better maintained with this process. A thin P:O compound may exist at the interface which also contributes to a high barrier height.

Original languageEnglish
Title of host publicationInterface Control of Electrical, Chemical, and Mechanical Properties
EditorsPeter Borgesen, Klavs F. Jensen, Roger A. Pollak
PublisherPubl by Materials Research Society
Pages141-146
Number of pages6
ISBN (Print)1558992170
StatePublished - 1994
EventProceedings of the Fall 1993 MRS Meeting - Boston, MA, USA
Duration: Nov 29 1993Dec 3 1993

Publication series

NameMaterials Research Society Symposium Proceedings
Volume318

Conference

ConferenceProceedings of the Fall 1993 MRS Meeting
CityBoston, MA, USA
Period11/29/9312/3/93

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