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Investigation of character and spatial distribution of threading edge dislocations in 4H-SiC epilayers by high-resolution topography

  • I. Kamata
  • , M. Nagano
  • , H. Tsuchida
  • , Yi Chen
  • , M. Dudley
  • Central Research Institute of Electric Power Industry
  • Stony Brook University

Research output: Contribution to journalArticlepeer-review

60 Scopus citations

Abstract

Topography image variation of threading edge dislocations (TEDs) in 4H-SiC epilayers has been investigated by grazing incidence high-resolution synchrotron topography. Six different images of TEDs resulting from an angle between the diffraction vector and the TED Burgers vector were confirmed by correlation between experimental topography images and simulation results. The TED-type distribution, dependent on the direction of the TED Burger vector, was examined on epitaxial wafers, while the spatial distribution of TEDs on a whole 2 in wafer along [1 1 2̄ 0] and [1 1̄ 0 0] was investigated.

Original languageEnglish
Pages (from-to)1416-1422
Number of pages7
JournalJournal of Crystal Growth
Volume311
Issue number5
DOIs
StatePublished - Feb 15 2009

Keywords

  • A1. Characterization
  • A1. Line defects
  • A1. X-ray topography
  • A3. Vapor phase epitaxy
  • B1. Silicon carbide
  • B2. Semiconducting materials

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