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Investigation of Lattice Strain in High Energy Implanted 4H-SiC Wafers by Al or N Atoms

  • Zeyu Chen
  • , Hongyu Peng
  • , Yafei Liu
  • , Qianyu Cheng
  • , Shanshan Hu
  • , Balaji Raghothamachar
  • , Michael Dudley
  • , Reza Ghandi
  • , Stacey Kennerly
  • , Peter Thieberger
  • Stony Brook University
  • General Electric
  • Brookhaven National Laboratory

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

6 Scopus citations

Abstract

4H-SiC wafers with 12 μm epilayer were implanted at the Tandem Van de Graaff facility at Brookhaven National Laboratory with tunable energy from 13 MeV up to 66 MeV. Lattice strains introduced by the implantation process were characterized in detail by synchrotron rocking curve X-ray topography (SXRCT) and reciprocal space maps (RSMs). It is observed that the strain levels correlate with the atomic mass and energy of acceleration of the dopant atoms.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2021- Selected peer-reviewed extended papers abstracts of which were presented at the 13th European Conference on Silicon Carbide and Related Materials, ECSCRM 2021
EditorsJean François Michaud, Luong Viet Phung, Daniel Alquier, Dominique Planson
PublisherTrans Tech Publications Ltd
Pages361-365
Number of pages5
ISBN (Print)9783035727609
DOIs
StatePublished - 2022
Event13th European Conference on Silicon Carbide and Related Materials, ECSCRM 2021 - Virtual, Online
Duration: Oct 24 2021Oct 28 2021

Publication series

NameMaterials Science Forum
Volume1062 MSF

Conference

Conference13th European Conference on Silicon Carbide and Related Materials, ECSCRM 2021
CityVirtual, Online
Period10/24/2110/28/21

Keywords

  • 4H-SiC
  • Ion Implantation
  • Lattice Strain
  • Synchrotron X-ray Rocking Curve Topography

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