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Ion beam assisted deposition of a thin film metallic glass

  • Vrishank Jambur
  • , Zijian Wang
  • , John Sunderland
  • , Soohyun Im
  • , Xuanxin Hu
  • , Sakiru Akinyemi
  • , John H. Perepezko
  • , Paul M. Voyles
  • , Izabela Szlufarska
  • University of Wisconsin – Madison

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

We have used ion beam assisted deposition to modify the properties of a thin film Pd77.5Cu6Si16.5 metallic glass without altering the composition. By irradiating the film surface during deposition, the mobility of surface atoms is enhanced, leading to the development of atomically smooth films with increased hardness and kinetic stability. Further, increasing the ion beam energy changes the crystallization pathways in the metallic glass films, pointing to changes in as-deposited structure. This approach to tune the properties of metallic glass films may unlock access to previously unobserved structural states.

Original languageEnglish
Article number140612
JournalThin Solid Films
Volume812
DOIs
StatePublished - Feb 15 2025

Keywords

  • Mechanical properties
  • Metallic glass
  • Stability
  • Thin films
  • Vapor deposition

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