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Ion implanted 3He targets for very low energy experiments

  • W. H. Geist
  • , Z. Ayer
  • , A. C. Hird
  • , E. J. Ludwig
  • , M. Wood
  • , K. A. Fletcher

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Helium-3 was implanted into tantalum and aluminum foils at implant energies ranging from 7 to 20 keV and with ion fluences exceeding 1019 ions/cm2 for the purpose of producing targets for nuclear reaction experiments. The effects of implant energy, fluence, and temperature on target thickness were studied. The foils were bombarded with deuterons to initiate the 3He(d,p)4He reaction near the 430 keV resonance to determine target thicknesses, thickness lifetimes, and to study the properties of this reaction as a polarization analyzer. Results indicate that these targets can be used in an efficient low-energy polarization analyzer.

Original languageEnglish
Pages (from-to)176-180
Number of pages5
JournalNuclear Inst. and Methods in Physics Research, B
Volume111
Issue number1-2
DOIs
StatePublished - Apr 1996

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