Kinetics and thermodynamics of the formation of thin film titanium disilicide

R. J. Kasica; E. J. Cotts; R. G. Ahrens

Kinetics and thermodynamics of the formation of thin film titanium disilicide

R. J. Kasica
, E. J. Cotts
, R. G. Ahrens

Physics

Binghamton University

State University of New York Binghamton University

Research output: Contribution to journal › Conference article › peer-review

Abstract

Multilayered diffusion couples consisting of alternating layers of titanium (Ti) and amorphous silicon (a-Si) have been fabricated using sputter deposition with a range of modulation lengths corresponding to an average composition of Ti₃₃Si₆₇. We have used differential scanning calorimetry to measure the enthalpy evolved during the solid state reaction a-Si + Ti → C49-TiSi₂ and have characterized the phases formed using x-ray diffraction analysis. An average measured enthalpy of formation, ΔH was found to be ΔH = -58 + 9 kJ/g atom for thin film samples. Using scanning and isothermal calorimetry measurements, we have also characterized the kinetics involved during the initial intermixing stage.

Original language	English
Pages (from-to)	301-305
Number of pages	5
Journal	Materials Research Society Symposium - Proceedings
Volume	398
State	Published - 1996
Event	Proceedings of the 1995 MRS Fall Meeting - Boston, MA, USA Duration: Nov 27 1995 → Dec 2 1995

Cite this

@article{cb32e104746e4881a8032b8bb92ce1b1,

title = "Kinetics and thermodynamics of the formation of thin film titanium disilicide",

abstract = "Multilayered diffusion couples consisting of alternating layers of titanium (Ti) and amorphous silicon (a-Si) have been fabricated using sputter deposition with a range of modulation lengths corresponding to an average composition of Ti33Si67. We have used differential scanning calorimetry to measure the enthalpy evolved during the solid state reaction a-Si + Ti → C49-TiSi2 and have characterized the phases formed using x-ray diffraction analysis. An average measured enthalpy of formation, ΔH was found to be ΔH = -58 + 9 kJ/g atom for thin film samples. Using scanning and isothermal calorimetry measurements, we have also characterized the kinetics involved during the initial intermixing stage.",

author = "Kasica, \{R. J.\} and Cotts, \{E. J.\} and Ahrens, \{R. G.\}",

year = "1996",

language = "English",

volume = "398",

pages = "301--305",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

note = "Proceedings of the 1995 MRS Fall Meeting ; Conference date: 27-11-1995 Through 02-12-1995",

}

TY - JOUR

T1 - Kinetics and thermodynamics of the formation of thin film titanium disilicide

AU - Kasica, R. J.

AU - Cotts, E. J.

AU - Ahrens, R. G.

PY - 1996

Y1 - 1996

N2 - Multilayered diffusion couples consisting of alternating layers of titanium (Ti) and amorphous silicon (a-Si) have been fabricated using sputter deposition with a range of modulation lengths corresponding to an average composition of Ti33Si67. We have used differential scanning calorimetry to measure the enthalpy evolved during the solid state reaction a-Si + Ti → C49-TiSi2 and have characterized the phases formed using x-ray diffraction analysis. An average measured enthalpy of formation, ΔH was found to be ΔH = -58 + 9 kJ/g atom for thin film samples. Using scanning and isothermal calorimetry measurements, we have also characterized the kinetics involved during the initial intermixing stage.

AB - Multilayered diffusion couples consisting of alternating layers of titanium (Ti) and amorphous silicon (a-Si) have been fabricated using sputter deposition with a range of modulation lengths corresponding to an average composition of Ti33Si67. We have used differential scanning calorimetry to measure the enthalpy evolved during the solid state reaction a-Si + Ti → C49-TiSi2 and have characterized the phases formed using x-ray diffraction analysis. An average measured enthalpy of formation, ΔH was found to be ΔH = -58 + 9 kJ/g atom for thin film samples. Using scanning and isothermal calorimetry measurements, we have also characterized the kinetics involved during the initial intermixing stage.

UR - https://www.scopus.com/pages/publications/0029728709

M3 - Conference article

SN - 0272-9172

VL - 398

SP - 301

EP - 305

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1995 MRS Fall Meeting

Y2 - 27 November 1995 through 2 December 1995

ER -

Kinetics and thermodynamics of the formation of thin film titanium disilicide

Abstract

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