Skip to main navigation Skip to search Skip to main content

Lateral epitaxial overgrowth of GaSb on GaSb and GaAs substrates by metalorganic chemical vapor deposition

  • S. S. Yi
  • , D. M. Hansen
  • , C. K. Inoki
  • , D. L. Harris
  • , T. S. Kuan
  • , T. F. Kuech

Research output: Contribution to journalArticlepeer-review

24 Scopus citations

Abstract

Lateral epitaxial overgrowth of GaSb on GaSb and GaAs substrates patterned with SiO2 or Si3N4 films by metalorganic chemical vapor deposition was accomplished using trimethylgallium and trimethylantimony. Transmission electron microscopy measurements show that coalesced films grown on GaSb substrates exhibit defect-free materials, while those on GaAs substrates show regular, small-angle crystal tilting originating from large lattice mismatch.

Original languageEnglish
Pages (from-to)842-844
Number of pages3
JournalApplied Physics Letters
Volume77
Issue number6
DOIs
StatePublished - Aug 7 2000

Fingerprint

Dive into the research topics of 'Lateral epitaxial overgrowth of GaSb on GaSb and GaAs substrates by metalorganic chemical vapor deposition'. Together they form a unique fingerprint.

Cite this