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Mosaicity and wafer bending in SiC wafers as measured by double and triple crystal X-ray rocking curve and peak position maps

  • K. W. Kirchner
  • , K. A. Jones
  • , M. A. Derenge
  • , M. Dudley
  • , A. Powell
  • U.S. Army Research Laboratory
  • Stony Brook University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Double and triple crystal rocking curve and peak position maps are constructed for a 4H-SiC wafer for the symmetric (0 0 0 8) reflection in the normal position, the same reflection for a sample rotated 90°, and an asymmetric (1 2 3̄ 6) reflection for the wafer in the normal position. These measurements were corrected for the 'wobble' in the instrument by scanning a 4" (1 1 1) Si wafer and assuming that the Si wafer was perfect and attributing the variations in the measurements to instrumental error. The x-ray measurements are correlated with a cross polar image, etch pit density map, white beam transmission x-ray topograph, and a laser light scan.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2006 - ECSCRM 20006 - Proceedings of the 6th European Conference on Silicon Carbide and Related Materials
EditorsN. Wright, C.M. Johnson, K. Vassilevski, I. Nikitina, A. Horsfall
PublisherTrans Tech Publications Ltd
Pages213-218
Number of pages6
ISBN (Print)0878494421, 9780878494422
DOIs
StatePublished - 2007
Event6th European Conference on Silicon Carbide and Related Materials, ECSCRM 2006 - Newcastle upon Tyne, United Kingdom
Duration: Sep 3 2006Sep 7 2007

Publication series

NameMaterials Science Forum
Volume556-557

Conference

Conference6th European Conference on Silicon Carbide and Related Materials, ECSCRM 2006
Country/TerritoryUnited Kingdom
CityNewcastle upon Tyne
Period09/3/0609/7/07

Keywords

  • High resolution x-ray diffraction
  • Peak position maps
  • Rocking curve maps

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