TY - GEN
T1 - Near-field thermal nanolithography using silk proteins
AU - Lee, W.
AU - Zhang, S.
AU - Liu, M.
AU - Tao, T. H.
N1 - Publisher Copyright: © 2016 OSA.
PY - 2016/12/16
Y1 - 2016/12/16
N2 - We present a thermal nanolithography technique by using silk proteins as resist with scanning near-field optical microscopy, which is capable of capable of selective curing and in-situ characterization of natural silk proteins at nanoscale resolution.
AB - We present a thermal nanolithography technique by using silk proteins as resist with scanning near-field optical microscopy, which is capable of capable of selective curing and in-situ characterization of natural silk proteins at nanoscale resolution.
UR - https://www.scopus.com/pages/publications/85010645291
U2 - 10.1364/cleo_at.2016.jw2a.106
DO - 10.1364/cleo_at.2016.jw2a.106
M3 - Conference contribution
T3 - 2016 Conference on Lasers and Electro-Optics, CLEO 2016
BT - 2016 Conference on Lasers and Electro-Optics, CLEO 2016
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2016 Conference on Lasers and Electro-Optics, CLEO 2016
Y2 - 5 June 2016 through 10 June 2016
ER -