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Optimization of SiGe HBT Technology for High Speed Analog and Mixed-Signal Applications

  • D. L. Harame
  • , J. M.C. Stork
  • , B. S. Meyerson
  • , K. Y.J. Hsu
  • , J. Cotte
  • , K. A. Jenkins
  • , J. D. Cressler
  • , P. Restle
  • , E. F. Crabbé
  • , S. Subbanna
  • , T. E. Tice
  • , B. W. Scharf
  • , J. A. Yasaitis

Research output: Contribution to journalConference articlepeer-review

59 Scopus citations

Abstract

SiGe HBTs have achieved record peak fT values values[l-2] and impressive digital circuit ECL RO delays[3] but no analog circuit results have been reported. In this work we investigate the leverage of SiGe HBTs for analog circuits by optimizing the Ge-profile for a high βVA product and high fT under the constraint of breakdown voltage and effective strain of the SiGe layer. Analytical calculations of β, VA, and fT of SiGe-HBTs as a function of Ge profile predict the largest performance advantage over Si BJTs for the most steeply graded Ge profile. SiGe-HBT transistors are fabricated with β VA products of 6160 V, BVCEO of 3.5 V and f max of 46 GHz, and compared to Si-BJTs fabricated with the same process. Digital performance is benchmarked by an ECL ring oscillator delay of 17.2 psec. The leverage for analog technology is demonstrated by fabrication of a 1GHz SiGe-HBT 12 bit Digital to Analog Convertor.

Original languageEnglish
Pages (from-to)71-74
Number of pages4
JournalTechnical Digest - International Electron Devices Meeting
StatePublished - 1993
EventProceedings of the 1993 IEEE International Electron Devices Meeting - Washington, DC, USA
Duration: Dec 5 1993Dec 8 1993

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