@inproceedings{c27c806e3bfd45de910c54321fb0861a,
title = "Photons, electrons, and acid yields in EUV photoresists: A progress report",
abstract = "This paper describes our initial investigation into building a greater understanding of the complex mechanism occurring during extreme ultraviolet (EUV) exposure of resist materials. In particular, we are focusing on the number and energy of photoelectrons generated and available for reaction with photoacid generators (PAGs). We propose that this approach will best enable the industry to develop resists capable of meeting resolution, line width roughness (LWR), and sensitivity requirements.",
keywords = "EELS, EUV Resists, Mechanism, Monte carlo, PAGs, Photoacid generators, Photoelectrons, Quantum yield",
author = "Robert Brainard and Elsayed Hassanein and Juntao Li and Piyush Pathak and Brad Thiel and Franco Cerrina and Richard Moore and Miguel Rodriguez and Boris Yakshinskiy and Elena Loginova and Theodore Madey and Richard Matyi and Matt Malloy and Andrew Rudack and Patrick Naulleau and Andrea W{\"u}est and Kim Dean",
year = "2008",
doi = "10.1117/12.773869",
language = "English",
isbn = "9780819471086",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Advances in Resist Materials and Processing Technology XXV",
note = "Advances in Resist Materials and Processing Technology XXV ; Conference date: 25-02-2008 Through 27-02-2008",
}