Positive-Tone Organoantimony Resists

Jordan Greenough; Nitinkumar S. Uphadyay; Shaheen Hasan; Munsaf Ali; Ricardo Burke; Greg Denbeaux; Robert L. Brainard

doi:10.2494/photopolymer.37.273

Positive-Tone Organoantimony Resists

Jordan Greenough
, Nitinkumar S. Uphadyay
, Shaheen Hasan
, Munsaf Ali
, Ricardo Burke
, Greg Denbeaux
, Robert L. Brainard

University at Albany

University at Albany

Research output: Contribution to journal › Article › peer-review

Abstract

Ligands play roles in determining the properties of metal-containing EUV resists. In this study, a new series of complexes of the type R₃Sb(O₂CR’)₂ have been developed, showcasing positive-tone imaging. Ten R₃Sb(O₂CR’)₂ complexes were synthesized with variations in the R and R’ groups. Studies focusing on development solution, polymerizable olefin content, and molecular weight of these complexes indicated that styrene carboxylate ligands and low molecular weight R groups demonstrated positive-tone performance with fast photospeeds.

Original language	English
Pages (from-to)	273-278
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	37
Issue number	3
DOIs	https://doi.org/10.2494/photopolymer.37.273
State	Published - 2024

Keywords

Antimony
Cross-linked
EUV
Photoresist
Positive-Tone

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10.2494/photopolymer.37.273

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title = "Positive-Tone Organoantimony Resists",

abstract = "Ligands play roles in determining the properties of metal-containing EUV resists. In this study, a new series of complexes of the type R3Sb(O2CR{\textquoteright})2 have been developed, showcasing positive-tone imaging. Ten R3Sb(O2CR{\textquoteright})2 complexes were synthesized with variations in the R and R{\textquoteright} groups. Studies focusing on development solution, polymerizable olefin content, and molecular weight of these complexes indicated that styrene carboxylate ligands and low molecular weight R groups demonstrated positive-tone performance with fast photospeeds.",

keywords = "Antimony, Cross-linked, EUV, Photoresist, Positive-Tone",

author = "Jordan Greenough and Uphadyay, \{Nitinkumar S.\} and Shaheen Hasan and Munsaf Ali and Ricardo Burke and Greg Denbeaux and Brainard, \{Robert L.\}",

note = "Publisher Copyright: {\textcopyright} 2024 SPST.",

year = "2024",

doi = "10.2494/photopolymer.37.273",

language = "English",

volume = "37",

pages = "273--278",

journal = "Journal of Photopolymer Science and Technology",

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TY - JOUR

T1 - Positive-Tone Organoantimony Resists

AU - Greenough, Jordan

AU - Uphadyay, Nitinkumar S.

AU - Hasan, Shaheen

AU - Ali, Munsaf

AU - Burke, Ricardo

AU - Denbeaux, Greg

AU - Brainard, Robert L.

PY - 2024

Y1 - 2024

N2 - Ligands play roles in determining the properties of metal-containing EUV resists. In this study, a new series of complexes of the type R3Sb(O2CR’)2 have been developed, showcasing positive-tone imaging. Ten R3Sb(O2CR’)2 complexes were synthesized with variations in the R and R’ groups. Studies focusing on development solution, polymerizable olefin content, and molecular weight of these complexes indicated that styrene carboxylate ligands and low molecular weight R groups demonstrated positive-tone performance with fast photospeeds.

AB - Ligands play roles in determining the properties of metal-containing EUV resists. In this study, a new series of complexes of the type R3Sb(O2CR’)2 have been developed, showcasing positive-tone imaging. Ten R3Sb(O2CR’)2 complexes were synthesized with variations in the R and R’ groups. Studies focusing on development solution, polymerizable olefin content, and molecular weight of these complexes indicated that styrene carboxylate ligands and low molecular weight R groups demonstrated positive-tone performance with fast photospeeds.

KW - Antimony

KW - Cross-linked

KW - EUV

KW - Photoresist

KW - Positive-Tone

UR - https://www.scopus.com/pages/publications/85201701504

U2 - 10.2494/photopolymer.37.273

DO - 10.2494/photopolymer.37.273

M3 - Article

SN - 0914-9244

VL - 37

SP - 273

EP - 278

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 3

ER -

Positive-Tone Organoantimony Resists

Abstract

Keywords

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