@inproceedings{dae7f1a66c904df7aa585261ac75b466,
title = "Protecting the nanotechnology workforce: A new protocol for characterization of filtercaptured nanomaterials from occupational exposure assessments",
abstract = "The most significant hurdle holding back exposure science, risk assessment, and the development of safety guidelines for the nanotechnology workforce is the lack of validated analytical techniques that accurately identify and characterize engineered nanomaterials (ENMs) captured in occupational settings. The associated costs, time, and lack of standardization of existing methods make it impossible for industries to implement exposure assessment programs or comply with new or forthcoming recommended exposure limits for ENMs. This research team seeks to advance the state of the science by developing and testing a new protocol for analysis of ENMs on filters by: further developing a novel hyperspectral imaging (HSI) method for highthroughput screening; evolving best-known methods for direct visualization of filter-captured ENMs by developing and incorporating advanced techniques into the new protocol; and testing the new protocol on real-world samples obtained during occupational exposure scenarios.",
keywords = "Electron microscopy, Hyperspectral imaging, Industrial hygiene, Occupational health, Semiconductor manufacturing",
author = "Neu-Baker, \{Nicole M.\} and Devin Smith and Alan Segrave and James Beach and Zurbenko, \{Igor G.\} and Kathleen Dunn and Brenner, \{Sara A.\}",
year = "2017",
language = "English",
series = "Advanced Materials - TechConnect Briefs 2017",
publisher = "TechConnect",
pages = "302--305",
editor = "Matthew Laudon and Fiona Case and Bart Romanowicz",
booktitle = "Advanced Materials - TechConnect Briefs 2017",
note = "11th Annual TechConnect World Innovation Conference and Expo, Held Jointly with the 20th Annual Nanotech Conference and Expo, and the 2017 National SBIR/STTR Conference ; Conference date: 14-05-2017 Through 17-05-2017",
}