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Quantum Dot DBR Lasers Monolithically Integrated on Silicon Photonics by In-Pocket Heteroepitaxy

  • Rosalyn Koscica
  • , Alec Skipper
  • , Bei Shi
  • , Kaiyin Feng
  • , Gerald Leake
  • , Michael Zylstra
  • , Joshua Herman
  • , Andrew Netherton
  • , Aparna Prabakaran
  • , Chen Shang
  • , Jonathan Klamkin
  • , David Harame
  • , John E. Bowers
  • University of California at Santa Barbara
  • Aeluma Inc.
  • Analog Photonics LLC
  • SUNY Polytechnic Institute

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

Monolithically integrated lasers on silicon photonics enable scalable, foundry-compatible production for data communications applications. However, material mismatches in heteroepitaxial systems and high coupling losses pose challenges for III-V integration on silicon. We combine three techniques: recessed silicon pockets for III-V growth, two-step heteroepitaxy using both MOCVD and MBE, and a polymer facet gap-fill approach to develop O-band InAs quantum dot lasers monolithically integrated on silicon photonics chiplets. Lasers coupled to silicon ring resonators and silicon nitride distributed Bragg reflectors (DBR) demonstrate single-mode lasing with side-mode suppression ratio up to 32 dB. Devices lase at temperatures up to 105 °C with an extrapolated operational lifetime of 6.2 years at 35 °C.

Original languageEnglish
Pages (from-to)5773-5781
Number of pages9
JournalJournal of Lightwave Technology
Volume43
Issue number12
DOIs
StatePublished - 2025

Keywords

  • Active-passive coupling
  • DBR laser
  • III-V on Si integration
  • O-band
  • monolithic integration
  • optical coupling
  • quantum dot laser
  • semiconductor laser
  • silicon photonics

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