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Revealing nanoscale dynamics during an epoxy curing reaction with X-ray photon correlation spectroscopy

  • Benjamin M. Yavitt
  • , Daniel Salatto
  • , Zhixing Huang
  • , Yuto T. Koga
  • , Maya K. Endoh
  • , Lutz Wiegart
  • , Sascha Poeller
  • , Stanislas Petrash
  • , Tadanori Koga
  • Stony Brook University
  • Brookhaven National Laboratory
  • Cornell University College of Agriculture and Life Sciences
  • Henkel KGaA

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

The evolution of nanoscale properties is measured during the thermally triggered curing of an industrial epoxy adhesive. We use X-ray photon correlation spectroscopy (XPCS) to track the progression of the curing reaction through the local dynamics of filler particles that reflect the formation of a thermoset network. Out-of-equilibrium dynamics are resolved through identification and analysis of the intensity-intensity autocorrelation functions obtained from XPCS. The characteristic time scale and local velocity of the filler is calculated as functions of time and temperature. We find that the dynamics speed up when approaching the curing temperature (Tcure), and decay rapidly once Tcure is reached. We compare the results from XPCS to conventional macroscale characterization by differential scanning calorimetry (DSC). The demonstration and implementation of nanoscale characterization of curing reactions by XPCS proves useful for future development and optimization of epoxy thermoset materials and other industrial adhesive systems.

Original languageEnglish
Article number114701
JournalJournal of Applied Physics
Volume127
Issue number11
DOIs
StatePublished - Mar 21 2020

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