@inproceedings{333622f89bc14027a65079ca1c7349df,
title = "RLS tradeoff vs. quantum yield of high PAG EUV resists",
abstract = "The effect of higher film quantum yields (FQYs) on the resolution, line-edge roughness, and sensitivity (RLS) tradeoff was evaluated for extreme ultraviolet (EUV, 13.5 nm) photoresists. We determined the FQY of increasingly high levels of an iodonium photoacid generator (PAG) using two acid detection methods. First, base titration methods were used to determine C-parameters for acid generation, and second, an acid-sensitive dye (Coumarin-6) was used to determine the amount of acid generated and ultimately, to determine absorbance and FQYs for both acid detection methods. The RLS performance of photoresists containing increasing levels of PAG up to ultrahigh loadings (5-40 wt\% PAG) was evaluated. RLS was characterized using two methods: • K Lup resist performance • Z-Parameter (Z = LER 2Esize* Resolution 3)",
keywords = "EUV, Film quantum yield, RLS tradeoff, Ultra high PAG resists",
author = "Craig Higgins and Alin Antohe and Greg Denbeaux and Seth Kruger and Jacque Georger and Robert Brainard",
year = "2009",
doi = "10.1117/12.814307",
language = "English",
isbn = "9780819475244",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Alternative Lithographic Technologies",
note = "Alternative Lithographic Technologies ; Conference date: 24-02-2009 Through 26-02-2009",
}