@inproceedings{15120f1ab11c488eb887b7488f81e168,
title = "Simulating massively parallel electron beam inspection for sub-20 nm defects",
abstract = "SEMATECH has initiated a program to develop massively-parallel electron beam defect inspection (MPEBI). Here we use JMONSEL simulations to generate expected imaging responses of chosen test cases of patterns and defects with ability to vary parameters for beam energy, spot size, pixel size, and/or defect material and form factor. The patterns are representative of the design rules for an aggressively-scaled FinFET-type design. With these simulated images and resulting shot noise, a signal-to-noise framework is developed, which relates to defect detection probabilities. Additionally, with this infrastructure the effect of detection chain noise and frequency dependent system response can be made, allowing for targeting of best recipe parameters for MPEBI validation experiments, ultimately leading to insights into how such parameters will impact MPEBI tool design, including necessary doses for defect detection and estimations of scanning speeds for achieving high throughput for HVM.",
keywords = "EBI, JMONSEL, SEM, defect detection, electron-beam defect inspection, massively parallel, multi-column, particle inspection",
author = "Bunday, \{Benjamin D.\} and Maseeh Mukhtar and Kathy Quoi and Brad Thiel and Matt Malloy",
note = "Publisher Copyright: {\textcopyright} 2015 SPIE.; 29th Conference on Metrology, Inspection, and Process Control for Microlithography ; Conference date: 23-02-2015 Through 26-02-2015",
year = "2015",
doi = "10.1117/12.2175573",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Sanchez, \{Martha I.\} and Cain, \{Jason P.\}",
booktitle = "Metrology, Inspection, and Process Control for Microlithography XXIX",
}