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Simulation of threading edge dislocation images in X-ray topographs of silicon carbide homo-epilayers

  • W. M. Vetter
  • , H. Tsuchida
  • , I. Kamata
  • , M. Dudley

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Among the types of dislocation seen in homo-epilayers of SiC grown upon 4H-SiC wafers with an 8° surface offcut are basal plane dislocations propagated into the epilayer at an 8° inclination, and threading edge dislocations. These types may be imaged by monochromatic synchrotron x-ray topography in the grazing-incidence reflection geometry using the 112̄8 reflection. Equations needed to apply the ray-tracing method of computer simulating x-ray topographic defect images in this experimental geometry were derived and used to simulate images of the threading edge dislocations. Simulations of the threading edge dislocations showed 4 μm wide white ovals with narrow arcs of dark contrast at their ends, inclined relative to the g-vector of the topograph according to the sign of their Burgers vector. These resembled the experimental topographs, inasmuch as was possible at the maximum resolution of x-ray topographs.

Original languageEnglish
Title of host publicationSilicon Carbide and Related Materials 2005, - Proceedings of the International Conference on Silicon Carbide and Related Materials 2005
PublisherTrans Tech Publications Ltd
Pages411-414
Number of pages4
EditionPART 1
ISBN (Print)9780878494255
DOIs
StatePublished - 2006
EventInternational Conference on Silicon Carbide and Related Materials 2005, (ICSCRM 2005) - Pittsburgh, PA, United States
Duration: Sep 18 2005Sep 23 2005

Publication series

NameMaterials Science Forum
NumberPART 1
Volume527-529

Conference

ConferenceInternational Conference on Silicon Carbide and Related Materials 2005, (ICSCRM 2005)
Country/TerritoryUnited States
CityPittsburgh, PA
Period09/18/0509/23/05

Keywords

  • Computer simulation
  • Epitaxial growth
  • Threading edge dislocation

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