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Structural and electrical properties of BaTiO3 thin films grown on p-Si substrates with different devices designs

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Abstract

RF magnetron sputtering of BaTiO3 on(100) p-Si was performed to produce a high-quality BaTiO3/p-Si interface and BaTiO3 insulator gates with high dielectric constant and low leakage current. Through different processing and device designs, different capacitor structures, including single layer amorphous, single layer polycrystalline and bi-layer amorphous on polycrystalline, were investigated in this study. Raman spectroscopy showed the optical phonon modes of the BaTiO3 thin films with different structures. The structural properties of the films were characterized by X-ray diffraction. Using both the quasistatic and the high-frequency capacitance-voltage measurements, the interface-trap density was estimated at high 1011 eV-1cm-2.

Original languageEnglish
Title of host publicationInterface Control of Electrical, Chemical, and Mechanical Properties
EditorsPeter Borgesen, Klavs F. Jensen, Roger A. Pollak
PublisherPubl by Materials Research Society
Pages501-506
Number of pages6
ISBN (Print)1558992170
StatePublished - 1994
EventProceedings of the Fall 1993 MRS Meeting - Boston, MA, USA
Duration: Nov 29 1993Dec 3 1993

Publication series

NameMaterials Research Society Symposium Proceedings
Volume318

Conference

ConferenceProceedings of the Fall 1993 MRS Meeting
CityBoston, MA, USA
Period11/29/9312/3/93

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