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Synthesis and evaluation of methyl methacrylate copolymers and terpolymers as electron‐beam resists. I. Poly(methyl methacrylate–methacrylic acid–methacryloyl chloride)

  • Institute for Microelectronics

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2 Scopus citations

Abstract

Terpolymers of methyl methacrylate with methacrylic acid and methacryloyl chloride [poly(MMA‐MAA‐MAC)] were synthesized with high yields by slow radical polymerization. The influence of the temperature of prebaking on the changes in the chemical composition and the molecular weight characteristics of poly(MMA‐5%MAA‐5%MAC) was studied by infrared spectroscopy and gel permeation chromatography. It was found that resists containing terpolymer with molecular weight (M̄w) of 41,000, which were prebaked at 100°C, were able to produce high contrast images (γ = 3.3) at doses of 16 μC/cm2.

Original languageEnglish
Pages (from-to)2705-2710
Number of pages6
JournalJournal of Applied Polymer Science
Volume41
Issue number11-12
DOIs
StatePublished - 1990

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