Abstract
Schottky contacts on n-In0.53Ga0.47As have been made by metal deposition on substrates cooled to a temperature of 77 K. The current-voltage and capacitance-voltage characteristics showed that the Schottky diodes formed at low temperature had a much improved barrier height compared to those formed at room temperature. The Schottky barrier height, φB, was found to be increased from ∼0.2 to 0.60 eV with Ag metal. For the low temperature diode, the saturation current density, J0, was about 4 orders smaller than for the room temperature diode. A transport mechanism dominated by thermionic emission over the barrier for the LT diode was found from current-voltage-temperature measurement. Thermionic field emission is seen for the higher doped substrate with reverse bias. Deep level transient spectroscopy studies of n-InGaAs low temperature diodes exhibited a bulk electron trap at Ec - 0.23 eV. The low temperature process appears to reduce metal induced surface damage and may form an MIS-like structure at the interface.
| Original language | English |
|---|---|
| Pages (from-to) | 1683-1686 |
| Number of pages | 4 |
| Journal | Solid State Electronics |
| Volume | 37 |
| Issue number | 10 |
| DOIs | |
| State | Published - Oct 1994 |
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