Skip to main navigation Skip to search Skip to main content

Toward the achievement of substrate melting and controlled solidification in thermal spraying

  • W. Zhang
  • , G. H. Wei
  • , H. Zhang
  • , L. L. Zheng
  • , D. O. Welch
  • , S. Sampath
  • Stony Brook University
  • Brookhaven National Laboratory

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The substrate is usually kept at a distant location in traditional thermal spraying, and substrate melting, which can improve splat adhesion usually does not happen. By moving the substrate close to the plasma flame and attaching a temperature control device to the backside of the substrate, as well as by additional heating from the molten droplets, substrate melting may occur and directional splat solidification becomes possible. In this proposed design, the substrate temperature is controlled by spray distance, flame temperature and initial substrate temperature. The variations of particle in-flight characteristics and contact interface temperature on spray distance are investigated. Optimal operating conditions are determined.

Original languageEnglish
Pages (from-to)717-736
Number of pages20
JournalPlasma Chemistry and Plasma Processing
Volume27
Issue number6
DOIs
StatePublished - Dec 2007

Keywords

  • Air plasma spray
  • Crystal growth
  • Plasma particle interaction
  • Splat solidification
  • Substrate melting

Fingerprint

Dive into the research topics of 'Toward the achievement of substrate melting and controlled solidification in thermal spraying'. Together they form a unique fingerprint.

Cite this